Three dimensional nano imprint lithography using photo-curable resin

Jun Taniguchi, Noriyuki Unno, Yasuhiro Kamiya, Nobuji Sakai, Takeshi Ohsaki

研究成果: Conference contribution査読

抄録

Three dimensional (3D) Nanoimprint Lithography (NIL) was carried out using photo-curable resin. NIL process was as follows: first, a fabricated NIL mold was coated with an anti-sticking layer. Then, a ultraviolet (UV) photo-curable resin was dispensed onto cleaned glass slides or polyethylene terephthalate (PET) films. Next, the mold was pressed against the resin on the substrate. The photo-curable resin was then exposed of UV light. The mold was then retracted, leaving behind a replica of its pattern. Using 3D mold with markedly uneven, evaluation of photo-curable resin was possible and it was found that weaker intermolecular force monomers improved transfer and release properties.

本文言語English
ホスト出版物のタイトル67th Annual Technical Conference of the Society of Plastics Engineers 2009, ANTEC 2009
ページ3044-3048
ページ数5
出版ステータスPublished - 25 11月 2009
イベント67th Annual Technical Conference of the Society of Plastics Engineers 2009, ANTEC 2009 - Chicago, IL, United States
継続期間: 22 6月 200924 6月 2009

出版物シリーズ

名前Annual Technical Conference - ANTEC, Conference Proceedings
5

Conference

Conference67th Annual Technical Conference of the Society of Plastics Engineers 2009, ANTEC 2009
国/地域United States
CityChicago, IL
Period22/06/0924/06/09

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