@inproceedings{afc6f683df20430a85ed846ff9841ce3,
title = "Three dimensional nano fabrication of single crystal silicon by focused ion beam and subsequent wet chemical etching",
abstract = "This study aims to fabricate three dimensional nanostructures of single crystal silicon by focused ion beam (FIB) process and subsequent wet chemical etching. Irradiated area by FIB acts as a mask against KOH solution, and consequently protruding nanostructures having several hundreds of nanometers in height can be fabricated through etch process. In order to control the height of nanostructures, the dependence of the masking effect on FIB irradiating conditions are studied under various parameters. As a result, it is found that the masking effect can be controlled by FIB irradiating conditions such as dose, accelerate voltage and dot pitch. Finally, three dimensional nanostructures can be fabricated based on these results, which indicates a possibility of industrial application as a novel three dimensional nanofabrication process.",
keywords = "Accelerate Voltage, Dose, Dot Pitch, Focused Ion Beam, KOH, Single Crystal Silicon, Three Dimensional Nanofabrication, Wet Chemical Etching",
author = "Noritaka Kawasegi and Noboru Morita and Shigeru Yamada and Noboru Takano and Tatsuo Oyama and Kiwamu Ashida and Jun Taniguchi and Iwao Miyamoto",
year = "2004",
month = dec,
day = "1",
language = "English",
isbn = "780183500X",
series = "Progress of Machining Technology - Proceedings of the Seventh International Conference on Progress of Machining Technology, ICPMT'2004",
pages = "330--335",
editor = "W. Chen and Y. Yamane and R. Fan and A. Ochi",
booktitle = "Progress of Machining Technology - Proceedings of the Seventh International Conference on Progress of Machining Technology, ICPMT'2004",
note = "Progress of Machining Technology - Proceedings of the Seventh International Conference on Progress Machining Technology, ICPMT'2004 ; Conference date: 08-12-2004 Through 11-12-2004",
}