TY - GEN
T1 - Rapid nanopatterning of metallic glass surface using etching enhancement induced by focused ion beam irradiation
AU - Kawasegi, N.
AU - Morita, N.
AU - Yamada, S.
AU - Takano, N.
AU - Oyama, T.
AU - Ashida, K.
AU - Taniguchi, Jun
AU - Miyamoto, I.
AU - Momota, S.
AU - Ofune, H.
PY - 2006/1/1
Y1 - 2006/1/1
N2 - This study proposes a novel method of nano-scale patterning on a metallic glass surface using focused ion beam (FIB) irradiation followed by wet chemical etching. We found that etch rate of a metallic glass surface irradiated with Ga+ ion beam can be drastically changed, and rapid patterning is possible utilizing this method. Cross-sectional transmission electron microscopy (TEM) analysis reveals that the metallic glass substrate remains amorphous phase after the irradiation. In addition, etching enhancement does not shown at the irradiation of Ar+ ions. Thus, these results indicate that the etching enhancement is resulted from the existence of implanted Ga+ ion rather than the change in crystallization.
AB - This study proposes a novel method of nano-scale patterning on a metallic glass surface using focused ion beam (FIB) irradiation followed by wet chemical etching. We found that etch rate of a metallic glass surface irradiated with Ga+ ion beam can be drastically changed, and rapid patterning is possible utilizing this method. Cross-sectional transmission electron microscopy (TEM) analysis reveals that the metallic glass substrate remains amorphous phase after the irradiation. In addition, etching enhancement does not shown at the irradiation of Ar+ ions. Thus, these results indicate that the etching enhancement is resulted from the existence of implanted Ga+ ion rather than the change in crystallization.
UR - http://www.scopus.com/inward/record.url?scp=84908323495&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:84908323495
T3 - Proceedings of the 6th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2006
SP - 397
EP - 400
BT - Proceedings of the 6th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2006
A2 - Zervos, H.
PB - euspen
T2 - 6th International Conference European Society for Precision Engineering and Nanotechnology, EUSPEN 2006
Y2 - 28 May 2006 through 1 June 2006
ER -