TY - JOUR
T1 - Possibility of directly sensing plant stress under environment temperature changes using electrochemical impedance spectroscopy
AU - Okajima, Mayu
AU - Nakagawa, Hina
AU - Sugiyama, Mutsumi
N1 - Publisher Copyright:
© 2023 The Japan Society of Applied Physics.
PY - 2023/8/1
Y1 - 2023/8/1
N2 - Electrochemical impedance spectroscopy (EIS) was used to examine the possibility of directly sensing plant stress under temperature environment changes. Changes in the extracellular and intracellular fluid resistances (Ro and Ri, respectively) were affected by changes in the cell phenomena under the temperature environment because Ro and Ri reflect the ionic fluctuations caused by the activation of cell membranes and change in solute viscosity, respectively, under the changing environment temperature. Examination of the effects of temperature environment change on plant cells via EIS measurements and theoretical calculations using the Okajima model can be used for in situ monitoring.
AB - Electrochemical impedance spectroscopy (EIS) was used to examine the possibility of directly sensing plant stress under temperature environment changes. Changes in the extracellular and intracellular fluid resistances (Ro and Ri, respectively) were affected by changes in the cell phenomena under the temperature environment because Ro and Ri reflect the ionic fluctuations caused by the activation of cell membranes and change in solute viscosity, respectively, under the changing environment temperature. Examination of the effects of temperature environment change on plant cells via EIS measurements and theoretical calculations using the Okajima model can be used for in situ monitoring.
KW - directly sensing of plant stress
KW - electrochemical impedance spectroscopy
KW - temperature conditions of plants
UR - http://www.scopus.com/inward/record.url?scp=85168520622&partnerID=8YFLogxK
U2 - 10.35848/1347-4065/acec24
DO - 10.35848/1347-4065/acec24
M3 - Article
AN - SCOPUS:85168520622
SN - 0021-4922
VL - 62
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 8
M1 - 088002
ER -