TY - GEN
T1 - Imprinting characteristics by photo-induced solidification of liquid polymer
AU - Komuro, M.
AU - Taniguchi, J.
AU - Tokano, Y.
AU - Inoue, S.
AU - Kimura, N.
AU - Hiroshima, H.
AU - Matsui, S.
PY - 2000
Y1 - 2000
N2 - Imprinting lithography is the most promising technology in terms of mass-production and low-cost of equipment, but thermal cycle above the glass transition temperature (more than 100°C) will worsen positional accuracy in stitching and overlay of patterns. In this paper, we describe the imprinting process using liquid polymer, which is solidified with Ultra-violet (UV) light exposure.
AB - Imprinting lithography is the most promising technology in terms of mass-production and low-cost of equipment, but thermal cycle above the glass transition temperature (more than 100°C) will worsen positional accuracy in stitching and overlay of patterns. In this paper, we describe the imprinting process using liquid polymer, which is solidified with Ultra-violet (UV) light exposure.
UR - http://www.scopus.com/inward/record.url?scp=84951914553&partnerID=8YFLogxK
U2 - 10.1109/IMNC.2000.872771
DO - 10.1109/IMNC.2000.872771
M3 - Conference contribution
AN - SCOPUS:84951914553
T3 - Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000
SP - 294
EP - 295
BT - Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - International Microprocesses and Nanotechnology Conference, MNC 2000
Y2 - 11 July 2000 through 13 July 2000
ER -