Fabrication of Moth-eye-structured Films with Two Types of Resin Separated by Micro-order Regions

Some organisms can control wettability for survival. Thus, these organisms are potential research targets for engineering applications. For example, a beetle is a desert dweller that captures water from fog and dew to drink. This characteristic shows potential for addressing the global water shortage. Beetle exoskeletons are composed of micropatterns with varying wettability (hydrophilic or hydrophobic). In this study, we propose a hybrid process that combines photolithography with UV nanoimprint lithography (UV-NIL). Photolithography is used to fabricate a resist micropattern on a nanopatterned substrate. In UV-NIL, the resist and UV-curable resin are released to fabricate micropatterns with different transferabilities and wettabilities. To realize this process, a resin compatible with photolithography and UV-NIL was developed.