Fabrication of low line edge roughness mold for photo-nanoimprint

Y. Kurashima; H. Hiroshima; M. Komuro; S. Kim; N. Yamazaki; J. Taniguchi; I. Miyamoto; H. Namatsu; S. Matsui

doi:10.1109/IMNC.2003.1268785

Fabrication of low line edge roughness mold for photo-nanoimprint

Y. Kurashima, H. Hiroshima, M. Komuro, S. Kim, N. Yamazaki, J. Taniguchi, I. Miyamoto, H. Namatsu, S. Matsui

電子システム工学科

研究成果: Conference contribution › 査読

抄録

In this paper, we fabricate low LER pattern on Spin On Glass (SOG) by simple nanoimprint process using a Si master mold obtained by anisotropic wet etching.

本文言語	English
ホスト出版物のタイトル	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
出版社	Institute of Electrical and Electronics Engineers Inc.
ページ	340-341
ページ数	2
ISBN（電子版）	4891140402, 9784891140403
DOI	https://doi.org/10.1109/IMNC.2003.1268785
出版ステータス	Published - 2003
イベント	International Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan 継続期間: 29 10月 2003 → 31 10月 2003

出版物シリーズ

名前	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Conference

Conference	International Microprocesses and Nanotechnology Conference, MNC 2003
国/地域	Japan
City	Tokyo
Period	29/10/03 → 31/10/03

文献へのアクセス

10.1109/IMNC.2003.1268785

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引用スタイル

Kurashima, Y., Hiroshima, H., Komuro, M., Kim, S., Yamazaki, N., Taniguchi, J., Miyamoto, I., Namatsu, H., & Matsui, S. (2003). Fabrication of low line edge roughness mold for photo-nanoimprint. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 (pp. 340-341). 記事 1268785 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2003.1268785

Kurashima, Y. ; Hiroshima, H. ; Komuro, M. その他. / Fabrication of low line edge roughness mold for photo-nanoimprint. Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. pp. 340-341 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

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title = "Fabrication of low line edge roughness mold for photo-nanoimprint",

abstract = "In this paper, we fabricate low LER pattern on Spin On Glass (SOG) by simple nanoimprint process using a Si master mold obtained by anisotropic wet etching.",

author = "Y. Kurashima and H. Hiroshima and M. Komuro and S. Kim and N. Yamazaki and J. Taniguchi and I. Miyamoto and H. Namatsu and S. Matsui",

note = "Publisher Copyright: {\textcopyright} 2003 Japan Soc. of Applied.; International Microprocesses and Nanotechnology Conference, MNC 2003 ; Conference date: 29-10-2003 Through 31-10-2003",

year = "2003",

doi = "10.1109/IMNC.2003.1268785",

language = "English",

series = "Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003",

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Kurashima, Y, Hiroshima, H, Komuro, M, Kim, S, Yamazaki, N, Taniguchi, J, Miyamoto, I, Namatsu, H & Matsui, S 2003, Fabrication of low line edge roughness mold for photo-nanoimprint. in Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003., 1268785, Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003, Institute of Electrical and Electronics Engineers Inc., pp. 340-341, International Microprocesses and Nanotechnology Conference, MNC 2003, Tokyo, Japan, 29/10/03. https://doi.org/10.1109/IMNC.2003.1268785

Fabrication of low line edge roughness mold for photo-nanoimprint. / Kurashima, Y.; Hiroshima, H.; Komuro, M. その他.
Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. p. 340-341 1268785 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

研究成果: Conference contribution › 査読

TY - GEN

T1 - Fabrication of low line edge roughness mold for photo-nanoimprint

AU - Kurashima, Y.

AU - Hiroshima, H.

AU - Komuro, M.

AU - Kim, S.

AU - Yamazaki, N.

AU - Taniguchi, J.

AU - Miyamoto, I.

AU - Namatsu, H.

AU - Matsui, S.

PY - 2003

Y1 - 2003

N2 - In this paper, we fabricate low LER pattern on Spin On Glass (SOG) by simple nanoimprint process using a Si master mold obtained by anisotropic wet etching.

AB - In this paper, we fabricate low LER pattern on Spin On Glass (SOG) by simple nanoimprint process using a Si master mold obtained by anisotropic wet etching.

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U2 - 10.1109/IMNC.2003.1268785

DO - 10.1109/IMNC.2003.1268785

M3 - Conference contribution

AN - SCOPUS:84949193312

T3 - Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

SP - 340

EP - 341

BT - Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - International Microprocesses and Nanotechnology Conference, MNC 2003

Y2 - 29 October 2003 through 31 October 2003

ER -

Kurashima Y, Hiroshima H, Komuro M, Kim S, Yamazaki N, Taniguchi J その他. Fabrication of low line edge roughness mold for photo-nanoimprint. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc. 2003. p. 340-341. 1268785. (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). doi: 10.1109/IMNC.2003.1268785

Fabrication of low line edge roughness mold for photo-nanoimprint

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