Electron beam lithography using inorganic resist at low acceleration voltage

Yoshiaki Ishii; Jun Taniguchi; Kiyoshi Ishikawa; Yoshinori Sakamoto; Isao Sato; Iwao Miyamoto

doi:10.1109/imnc.2005.203762

Electron beam lithography using inorganic resist at low acceleration voltage

Yoshiaki Ishii, Jun Taniguchi, Kiyoshi Ishikawa, Yoshinori Sakamoto, Isao Sato, Iwao Miyamoto

電子システム工学科

研究成果: Conference contribution › 査読

本文言語	English
ホスト出版物のタイトル	Digest of Papers - Microprocesses and Nanotechnology 2005
ホスト出版物のサブタイトル	2005 International Microprocesses and Nanotechnology Conference
出版社	IEEE Computer Society
ページ	110-111
ページ数	2
ISBN（印刷版）	4990247221, 9784990247225
DOI	https://doi.org/10.1109/imnc.2005.203762
出版ステータス	Published - 2005
イベント	2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan 継続期間: 25 10月 2005 → 28 10月 2005

出版物シリーズ

名前	Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference
巻	2005

Conference

Conference	2005 International Microprocesses and Nanotechnology Conference
国/地域	Japan
City	Tokyo
Period	25/10/05 → 28/10/05

文献へのアクセス

10.1109/imnc.2005.203762

他のファイルとリンク

Scopusの出版物のリンク

引用スタイル

Ishii, Y., Taniguchi, J., Ishikawa, K., Sakamoto, Y., Sato, I., & Miyamoto, I. (2005). Electron beam lithography using inorganic resist at low acceleration voltage. In Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference (pp. 110-111). 記事 1595238 (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference; Vol. 2005). IEEE Computer Society. https://doi.org/10.1109/imnc.2005.203762

Ishii, Yoshiaki ; Taniguchi, Jun ; Ishikawa, Kiyoshi その他. / Electron beam lithography using inorganic resist at low acceleration voltage. Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. IEEE Computer Society, 2005. pp. 110-111 (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference).

@inproceedings{3509df471f4f4ec289663d9291e73b54,

title = "Electron beam lithography using inorganic resist at low acceleration voltage",

keywords = "Electron beam lithoguraphy, Inorganic resist, Low acceleration voltage, Nanoimprint",

author = "Yoshiaki Ishii and Jun Taniguchi and Kiyoshi Ishikawa and Yoshinori Sakamoto and Isao Sato and Iwao Miyamoto",

year = "2005",

doi = "10.1109/imnc.2005.203762",

language = "English",

isbn = "4990247221",

series = "Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference",

publisher = "IEEE Computer Society",

pages = "110--111",

booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2005",

note = "2005 International Microprocesses and Nanotechnology Conference ; Conference date: 25-10-2005 Through 28-10-2005",

}

Ishii, Y, Taniguchi, J, Ishikawa, K, Sakamoto, Y, Sato, I & Miyamoto, I 2005, Electron beam lithography using inorganic resist at low acceleration voltage. in Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference., 1595238, Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference, vol. 2005, IEEE Computer Society, pp. 110-111, 2005 International Microprocesses and Nanotechnology Conference, Tokyo, Japan, 25/10/05. https://doi.org/10.1109/imnc.2005.203762

Electron beam lithography using inorganic resist at low acceleration voltage. / Ishii, Yoshiaki; Taniguchi, Jun; Ishikawa, Kiyoshi その他.
Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. IEEE Computer Society, 2005. p. 110-111 1595238 (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference; Vol. 2005).

研究成果: Conference contribution › 査読

TY - GEN

T1 - Electron beam lithography using inorganic resist at low acceleration voltage

AU - Ishii, Yoshiaki

AU - Taniguchi, Jun

AU - Ishikawa, Kiyoshi

AU - Sakamoto, Yoshinori

AU - Sato, Isao

AU - Miyamoto, Iwao

PY - 2005

Y1 - 2005

KW - Electron beam lithoguraphy

KW - Inorganic resist

KW - Low acceleration voltage

KW - Nanoimprint

UR - http://www.scopus.com/inward/record.url?scp=33847199026&partnerID=8YFLogxK

U2 - 10.1109/imnc.2005.203762

DO - 10.1109/imnc.2005.203762

M3 - Conference contribution

AN - SCOPUS:33847199026

SN - 4990247221

SN - 9784990247225

T3 - Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference

SP - 110

EP - 111

BT - Digest of Papers - Microprocesses and Nanotechnology 2005

PB - IEEE Computer Society

T2 - 2005 International Microprocesses and Nanotechnology Conference

Y2 - 25 October 2005 through 28 October 2005

ER -

Ishii Y, Taniguchi J, Ishikawa K, Sakamoto Y, Sato I, Miyamoto I. Electron beam lithography using inorganic resist at low acceleration voltage. In Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference. IEEE Computer Society. 2005. p. 110-111. 1595238. (Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference). doi: 10.1109/imnc.2005.203762