TY - JOUR
T1 - Effect of the valence band maximum control of Cu(In,Ga)Se2 photoelectrode surface on water splitting
AU - Yashiro, Takahiko
AU - Sugiyama, Mutsumi
N1 - Publisher Copyright:
© 2022 The Japan Society of Applied Physics
PY - 2022/5
Y1 - 2022/5
N2 - The effects of valence band maximum (VBM) position control on the Cu(In,Ga)Se2 (CIGS) photoelectrode surface during the photoelectrochemical (PEC) water splitting using CIGS thin films were studied. First, a hole-blocking layer was obtained by replacing Se with S atoms to achieve VBM position control. The corresponding increase in photocurrent density suppressed the recombination at the photoelectrode/electrolyte interface. Subsequently, the CdS layer with lower VBM position than the CIGS layer was deposited on the CIGS photoelectrode. The results showed that the onset potential and photocurrent density increased due to the VBM position of the CdS layer. This study shows that water splitting could be effectively improved by controlling the VBM position of the photoelectrode surface.
AB - The effects of valence band maximum (VBM) position control on the Cu(In,Ga)Se2 (CIGS) photoelectrode surface during the photoelectrochemical (PEC) water splitting using CIGS thin films were studied. First, a hole-blocking layer was obtained by replacing Se with S atoms to achieve VBM position control. The corresponding increase in photocurrent density suppressed the recombination at the photoelectrode/electrolyte interface. Subsequently, the CdS layer with lower VBM position than the CIGS layer was deposited on the CIGS photoelectrode. The results showed that the onset potential and photocurrent density increased due to the VBM position of the CdS layer. This study shows that water splitting could be effectively improved by controlling the VBM position of the photoelectrode surface.
UR - http://www.scopus.com/inward/record.url?scp=85130531444&partnerID=8YFLogxK
U2 - 10.35848/1347-4065/ac52d6
DO - 10.35848/1347-4065/ac52d6
M3 - Article
AN - SCOPUS:85130531444
SN - 0021-4922
VL - 61
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 5
M1 - 051003
ER -