TY - GEN
T1 - Diamond mold for nanoimprint lithography
AU - Taniguchi, Jun
AU - Tokano, Yuji
AU - Miyamoto, Iwao
AU - Komuro, Masanori
AU - Hiroshima, Hiroshi
AU - Kobayashi, Kazuhiko
AU - Miyazaki, Takeshi
AU - Ohyi, Hideyuki
PY - 2000/1/1
Y1 - 2000/1/1
N2 - Nanoimprint lithography (NIL) is a major breakthrough in nano-patteming because it can produce sub-10 nm feature size over a large area with a high throughput and low cost1). NIL fabricates a resist pattern by deforming the resist shape on the substrate using mold compression. In order to obtain high productivity, the mold requires durability for repeatedly NIL process. Diamond is a candidate material for high productivity because it is the hardest material. Therefore, we fabricate diamond mold using electron beam lithography. Furthermore, using a diamond mold instead of diamond indenter of conventional hardness tester, direct nanoimprint becomes possible, in this case, nanoimprint experiment carries out very readily.
AB - Nanoimprint lithography (NIL) is a major breakthrough in nano-patteming because it can produce sub-10 nm feature size over a large area with a high throughput and low cost1). NIL fabricates a resist pattern by deforming the resist shape on the substrate using mold compression. In order to obtain high productivity, the mold requires durability for repeatedly NIL process. Diamond is a candidate material for high productivity because it is the hardest material. Therefore, we fabricate diamond mold using electron beam lithography. Furthermore, using a diamond mold instead of diamond indenter of conventional hardness tester, direct nanoimprint becomes possible, in this case, nanoimprint experiment carries out very readily.
UR - http://www.scopus.com/inward/record.url?scp=67650152220&partnerID=8YFLogxK
U2 - 10.1109/IMNC.2000.872699
DO - 10.1109/IMNC.2000.872699
M3 - Conference contribution
AN - SCOPUS:67650152220
T3 - Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000
SP - 190
EP - 191
BT - Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - International Microprocesses and Nanotechnology Conference, MNC 2000
Y2 - 11 July 2000 through 13 July 2000
ER -