TY - JOUR
T1 - A multi-step ICTS method for analyzing time-dependent changes of interface states in Pt/Nb-doped SrTiO3 junction
AU - Zheng, Yumeng
AU - Kinoshita, Kentaro
N1 - Publisher Copyright:
© 2025 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
PY - 2025/2/1
Y1 - 2025/2/1
N2 - Pt/Nb:SrTiO3 is a good candidate for interface-type resistance random-access memory, which is highly anticipated for use in next-generation memory and neuromorphic computing. The current relaxation phenomenon after resistive switching is a key property for time-series data processing in machine learning. However, the mechanisms of such phenomena remain puzzling, leading to difficulties in practical applications. Here, we proposed multi-step Isothermal Capacitance Transient Spectroscopy (MS-ICTS) to obtain detailed information about interface states and their temporal changes after resistance switching in low Nb concentration (0.05 wt%) devices, and how the interface states affect device properties. We found that in the initial state before high voltage application, there are no interface states above Fermi-energy. However, shallow interface states were generated after applying high voltage for resistance switching, which decreased the Schottky barrier height and the resistance to a low resistance state. Furthermore, such voltage-induced interface states were found to naturally decrease over time.
AB - Pt/Nb:SrTiO3 is a good candidate for interface-type resistance random-access memory, which is highly anticipated for use in next-generation memory and neuromorphic computing. The current relaxation phenomenon after resistive switching is a key property for time-series data processing in machine learning. However, the mechanisms of such phenomena remain puzzling, leading to difficulties in practical applications. Here, we proposed multi-step Isothermal Capacitance Transient Spectroscopy (MS-ICTS) to obtain detailed information about interface states and their temporal changes after resistance switching in low Nb concentration (0.05 wt%) devices, and how the interface states affect device properties. We found that in the initial state before high voltage application, there are no interface states above Fermi-energy. However, shallow interface states were generated after applying high voltage for resistance switching, which decreased the Schottky barrier height and the resistance to a low resistance state. Furthermore, such voltage-induced interface states were found to naturally decrease over time.
KW - ICTS
KW - Nb-doped SrTiO
KW - interface states
KW - interface-type ReRAM
KW - memristor
UR - https://www.scopus.com/pages/publications/85218909235
U2 - 10.35848/1347-4065/adb162
DO - 10.35848/1347-4065/adb162
M3 - Article
AN - SCOPUS:85218909235
SN - 0021-4922
VL - 64
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 2
M1 - 02SP41
ER -