Three dimensional nano imprint lithography using photo-curable resin

Jun Taniguchi, Noriyuki Unno, Yasuhiro Kamiya, Nobuji Sakai, Takeshi Ohsaki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Three dimensional (3D) Nanoimprint Lithography (NIL) was carried out using photo-curable resin. NIL process was as follows: first, a fabricated NIL mold was coated with an anti-sticking layer. Then, a ultraviolet (UV) photo-curable resin was dispensed onto cleaned glass slides or polyethylene terephthalate (PET) films. Next, the mold was pressed against the resin on the substrate. The photo-curable resin was then exposed of UV light. The mold was then retracted, leaving behind a replica of its pattern. Using 3D mold with markedly uneven, evaluation of photo-curable resin was possible and it was found that weaker intermolecular force monomers improved transfer and release properties.

Original languageEnglish
Title of host publication67th Annual Technical Conference of the Society of Plastics Engineers 2009, ANTEC 2009
Pages3044-3048
Number of pages5
Publication statusPublished - 25 Nov 2009
Event67th Annual Technical Conference of the Society of Plastics Engineers 2009, ANTEC 2009 - Chicago, IL, United States
Duration: 22 Jun 200924 Jun 2009

Publication series

NameAnnual Technical Conference - ANTEC, Conference Proceedings
Volume5

Conference

Conference67th Annual Technical Conference of the Society of Plastics Engineers 2009, ANTEC 2009
CountryUnited States
CityChicago, IL
Period22/06/0924/06/09

Keywords

  • Electron beam lithography
  • Glassy carbon
  • Nanoimprint lithography
  • Photo-curable resin
  • Three dimensional mold

Cite this

Taniguchi, J., Unno, N., Kamiya, Y., Sakai, N., & Ohsaki, T. (2009). Three dimensional nano imprint lithography using photo-curable resin. In 67th Annual Technical Conference of the Society of Plastics Engineers 2009, ANTEC 2009 (pp. 3044-3048). (Annual Technical Conference - ANTEC, Conference Proceedings; Vol. 5).