STM study of Si(1 1 3) 3 × 2-Ga surface

Katsumi Irokawa, Yuichiro Nagura, Hidekazu Kobayashi, Shinsuke Hara, Hiroki I. Fujishiro, Hirofumi Miki, Akira Kawazu, Kazuyuki Watanabe

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

The Ga-adsorbed structure on Si(1 1 3) surface at low coverage has been studied by scanning tunneling microscopy (STM). The bright protrusion corresponding to the position of the dimer without the interstitial Si atom of the clean surface disappeared in the filled-state STM image after Ga adsorption, although the protrusion due to the Si adatom still remained. On the basis of the adatom-dimer-interstitial (ADI) model, this result indicates that the Ga atom is adsorbed interstitially at the center of another pentamer that does not have the interstitial Si atom. An ab initio calculation was performed and STM images were simulated.

Original languageEnglish
Pages (from-to)1197-1202
Number of pages6
JournalSurface Science
Volume603
Issue number9
DOIs
Publication statusPublished - 1 May 2009

Keywords

  • Density functional calculations
  • Gallium
  • Scanning tunneling microscopy
  • Silicon
  • Surface structure

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