Abstract
A novel photosensitive polyolefinsulfone bearing a photofunctional side-chain was synthesized and photochemical properties were investigated. Polyolefinsulfones have been utilized in electron beam lithography. The decomposition of the polyolefinsulfone is induced not only by electron beam irradiation but also by mixing with bases. In this study, we designed a polyolefinsulfone which processes a photofunctional group that generates a basic moiety.
| Original language | English |
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| Pages | 1356 |
| Number of pages | 1 |
| Publication status | Published - 2005 |
| Event | 54th SPSJ Annual Meeting 2005 - Yokohama, Japan Duration: 25 May 2005 → 27 May 2005 |
Conference
| Conference | 54th SPSJ Annual Meeting 2005 |
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| Country/Territory | Japan |
| City | Yokohama |
| Period | 25/05/05 → 27/05/05 |
Keywords
- Photofunctional
- Polyolefinsulfone
- UV irradiation