Photo etching of polyimide thin film by TiO2 micro wire prepared using phase separation-selective leaching method

Y. Sone; K. Nishio; A. Yasumori

Photo etching of polyimide thin film by TiO₂ micro wire prepared using phase separation-selective leaching method

Y. Sone, K. Nishio, A. Yasumori

Department of Materials Science and Technology

Research output: Contribution to journal › Conference article › peer-review

2 Citations (Scopus)

Abstract

TiO₂ photocatalysts have a strong oxidation ability for organic compounds under UV irradiation. The surfaces of polyimide and polymethyl methacrylate (PMMA) were photocatalytically machined using a porous TiO ₂ wire prepared by phase separation and selective leaching with elongation. After UV irradiation, these surfaces were decomposed along the length of the TiO₂ wire. Such surface decomposition depended on the irradiation angle of UV light and irradiation time. The machining rate of PMMA was higher than that of the polyimide.

Original language	English
Article number	KK3.13
Pages (from-to)	211-216
Number of pages	6
Journal	Materials Research Society Symposium Proceedings
Volume	849
Publication status	Published - 2005
Event	2004 MRS Fall Meeting - Boston, MA, United States Duration: 29 Nov 2004 → 2 Dec 2004

Cite this

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title = "Photo etching of polyimide thin film by TiO2 micro wire prepared using phase separation-selective leaching method",

abstract = "TiO2 photocatalysts have a strong oxidation ability for organic compounds under UV irradiation. The surfaces of polyimide and polymethyl methacrylate (PMMA) were photocatalytically machined using a porous TiO 2 wire prepared by phase separation and selective leaching with elongation. After UV irradiation, these surfaces were decomposed along the length of the TiO2 wire. Such surface decomposition depended on the irradiation angle of UV light and irradiation time. The machining rate of PMMA was higher than that of the polyimide.",

author = "Y. Sone and K. Nishio and A. Yasumori",

year = "2005",

language = "English",

volume = "849",

pages = "211--216",

journal = "Materials Research Society Symposium Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "2004 MRS Fall Meeting ; Conference date: 29-11-2004 Through 02-12-2004",

}

TY - JOUR

T1 - Photo etching of polyimide thin film by TiO2 micro wire prepared using phase separation-selective leaching method

AU - Sone, Y.

AU - Nishio, K.

AU - Yasumori, A.

PY - 2005

Y1 - 2005

N2 - TiO2 photocatalysts have a strong oxidation ability for organic compounds under UV irradiation. The surfaces of polyimide and polymethyl methacrylate (PMMA) were photocatalytically machined using a porous TiO 2 wire prepared by phase separation and selective leaching with elongation. After UV irradiation, these surfaces were decomposed along the length of the TiO2 wire. Such surface decomposition depended on the irradiation angle of UV light and irradiation time. The machining rate of PMMA was higher than that of the polyimide.

AB - TiO2 photocatalysts have a strong oxidation ability for organic compounds under UV irradiation. The surfaces of polyimide and polymethyl methacrylate (PMMA) were photocatalytically machined using a porous TiO 2 wire prepared by phase separation and selective leaching with elongation. After UV irradiation, these surfaces were decomposed along the length of the TiO2 wire. Such surface decomposition depended on the irradiation angle of UV light and irradiation time. The machining rate of PMMA was higher than that of the polyimide.

UR - http://www.scopus.com/inward/record.url?scp=23844540332&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:23844540332

SN - 0272-9172

VL - 849

SP - 211

EP - 216

JO - Materials Research Society Symposium Proceedings

JF - Materials Research Society Symposium Proceedings

M1 - KK3.13

T2 - 2004 MRS Fall Meeting

Y2 - 29 November 2004 through 2 December 2004

ER -

Photo etching of polyimide thin film by TiO₂ micro wire prepared using phase separation-selective leaching method

Abstract

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