Novel oligomeric base-amplifiers to apply to photoreactive materials

Ken'ichi Aoki; Koji Arimitsu; Kunihiro Ichimura

Novel oligomeric base-amplifiers to apply to photoreactive materials

Ken'ichi Aoki, Koji Arimitsu, Kunihiro Ichimura

Research output: Contribution to conference › Paper › peer-review

Abstract

Novel oligomeric base-amplifiers with multiple 9-fluorenylcarbamate units were applied to photoreactive materials in combination with a photobase generator and conventional epoxy polymers. It was revealed that the sensitivity of the photopolymers could be improved with an increase in the number of the terminal base-amplifying units attached to the oligomeric chains.

Original language	English
Pages	4039
Number of pages	1
Publication status	Published - 2005
Event	54th SPSJ Symposium on Macromolecules - Yamagata, Japan Duration: 20 Sept 2005 → 22 Sept 2005

Conference

Conference	54th SPSJ Symposium on Macromolecules
Country/Territory	Japan
City	Yamagata
Period	20/09/05 → 22/09/05

Keywords

Autocatalytic reaction
Base-amplifying oligomer
Base-proliferation reaction
Multifunctional units
Photopolymer system

Cite this

@conference{058992df551a4635a71153659a2d6834,

title = "Novel oligomeric base-amplifiers to apply to photoreactive materials",

abstract = "Novel oligomeric base-amplifiers with multiple 9-fluorenylcarbamate units were applied to photoreactive materials in combination with a photobase generator and conventional epoxy polymers. It was revealed that the sensitivity of the photopolymers could be improved with an increase in the number of the terminal base-amplifying units attached to the oligomeric chains.",

keywords = "Autocatalytic reaction, Base-amplifying oligomer, Base-proliferation reaction, Multifunctional units, Photopolymer system",

author = "Ken'ichi Aoki and Koji Arimitsu and Kunihiro Ichimura",

year = "2005",

language = "English",

pages = "4039",

note = "54th SPSJ Symposium on Macromolecules ; Conference date: 20-09-2005 Through 22-09-2005",

}

TY - CONF

T1 - Novel oligomeric base-amplifiers to apply to photoreactive materials

AU - Aoki, Ken'ichi

AU - Arimitsu, Koji

AU - Ichimura, Kunihiro

PY - 2005

Y1 - 2005

N2 - Novel oligomeric base-amplifiers with multiple 9-fluorenylcarbamate units were applied to photoreactive materials in combination with a photobase generator and conventional epoxy polymers. It was revealed that the sensitivity of the photopolymers could be improved with an increase in the number of the terminal base-amplifying units attached to the oligomeric chains.

AB - Novel oligomeric base-amplifiers with multiple 9-fluorenylcarbamate units were applied to photoreactive materials in combination with a photobase generator and conventional epoxy polymers. It was revealed that the sensitivity of the photopolymers could be improved with an increase in the number of the terminal base-amplifying units attached to the oligomeric chains.

KW - Autocatalytic reaction

KW - Base-amplifying oligomer

KW - Base-proliferation reaction

KW - Multifunctional units

KW - Photopolymer system

UR - https://www.scopus.com/pages/publications/33645647387

M3 - Paper

AN - SCOPUS:33645647387

SP - 4039

T2 - 54th SPSJ Symposium on Macromolecules

Y2 - 20 September 2005 through 22 September 2005

ER -

Novel oligomeric base-amplifiers to apply to photoreactive materials

Abstract

Conference

Keywords

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