Microchannel fabrication via ultraviolet-nanoimprint lithography and electron-beam lithography using an ultraviolet-curable positive-tone electron-beam resist

Haruki Matsumoto, Takao Okabe, Jun Taniguchi

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1 Citation (Scopus)

Abstract

In this study, we propose a process to fabricate microchannels for in-situ cell cultivation and observation to facilitate a variety of biological experiments. The fabrication process involved a combination of ultraviolet nanoimprint lithography (UV-NIL) followed by electron-beam lithography (EBL) with a UV-curable EB resist polymer to form micropatterns directly on the imprinted microscale patterns. Here, we demonstrate the fabrication of microscale flow paths and reservoirs by UV-NIL and the subsequent formation of capillary flow paths and cell traps on the order of 2–4 μm by EBL. The UV-NIL/EBL hybrid technique can be used to fabricate complex microfluidic devices and is expected to be useful for lab-on-a-chip applications that require fine and complex flow paths.

Original languageEnglish
Article number111278
JournalMicroelectronic Engineering
Volume226
DOIs
Publication statusPublished - 1 Apr 2020

Keywords

  • Electron-beam lithography (EBL)
  • Microchannel
  • Resist polymer
  • Ultraviolet-nanoimprint lithography (UV-NIL)

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