Ion-bombardment-enhanced etching of quartz

Takashi Okumoto; Jun Taniguchi; Sadao Momota; Yasuo Kogo; Noritaka Kawasegi; Noboru Morita

Ion-bombardment-enhanced etching of quartz

Takashi Okumoto, Jun Taniguchi, Sadao Momota, Yasuo Kogo, Noritaka Kawasegi, Noboru Morita

Research output: Contribution to conference › Paper › peer-review

Abstract

Mask-free and rapid patterning of fused quartz surface is useful for various applications, such as rapid prototyping of optical elements and UV nanoimprint molds. We examined the fabrication of patterned quartz for such applications by ion-bombardment-enhanced etching using buffered hydrofluoric acid as the etching solution.

Original language	English
Publication status	Published - 1 Dec 2009
Event	5th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2009 - Osaka, Japan Duration: 2 Dec 2009 → 4 Dec 2009

Conference

Conference	5th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2009
Country/Territory	Japan
City	Osaka
Period	2/12/09 → 4/12/09

Keywords

Atomic force microscope
Buffered hydrofluoric acid
Focused ion beam
Quartz

Cite this

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title = "Ion-bombardment-enhanced etching of quartz",

abstract = "Mask-free and rapid patterning of fused quartz surface is useful for various applications, such as rapid prototyping of optical elements and UV nanoimprint molds. We examined the fabrication of patterned quartz for such applications by ion-bombardment-enhanced etching using buffered hydrofluoric acid as the etching solution.",

keywords = "Atomic force microscope, Buffered hydrofluoric acid, Focused ion beam, Quartz",

author = "Takashi Okumoto and Jun Taniguchi and Sadao Momota and Yasuo Kogo and Noritaka Kawasegi and Noboru Morita",

year = "2009",

month = dec,

day = "1",

language = "English",

note = "5th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2009 ; Conference date: 02-12-2009 Through 04-12-2009",

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TY - CONF

T1 - Ion-bombardment-enhanced etching of quartz

AU - Okumoto, Takashi

AU - Taniguchi, Jun

AU - Momota, Sadao

AU - Kogo, Yasuo

AU - Kawasegi, Noritaka

AU - Morita, Noboru

PY - 2009/12/1

Y1 - 2009/12/1

N2 - Mask-free and rapid patterning of fused quartz surface is useful for various applications, such as rapid prototyping of optical elements and UV nanoimprint molds. We examined the fabrication of patterned quartz for such applications by ion-bombardment-enhanced etching using buffered hydrofluoric acid as the etching solution.

AB - Mask-free and rapid patterning of fused quartz surface is useful for various applications, such as rapid prototyping of optical elements and UV nanoimprint molds. We examined the fabrication of patterned quartz for such applications by ion-bombardment-enhanced etching using buffered hydrofluoric acid as the etching solution.

KW - Atomic force microscope

KW - Buffered hydrofluoric acid

KW - Focused ion beam

KW - Quartz

UR - http://www.scopus.com/inward/record.url?scp=84883346380&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:84883346380

T2 - 5th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2009

Y2 - 2 December 2009 through 4 December 2009

ER -

Ion-bombardment-enhanced etching of quartz

Abstract

Conference

Keywords

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