Ion-bombardment-enhanced etching of quartz

Takashi Okumoto, Jun Taniguchi, Sadao Momota, Yasuo Kogo, Noritaka Kawasegi, Noboru Morita

Research output: Contribution to conferencePaper

Abstract

Mask-free and rapid patterning of fused quartz surface is useful for various applications, such as rapid prototyping of optical elements and UV nanoimprint molds. We examined the fabrication of patterned quartz for such applications by ion-bombardment-enhanced etching using buffered hydrofluoric acid as the etching solution.

Original languageEnglish
Publication statusPublished - 1 Dec 2009
Event5th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2009 - Osaka, Japan
Duration: 2 Dec 20094 Dec 2009

Conference

Conference5th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2009
CountryJapan
CityOsaka
Period2/12/094/12/09

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Keywords

  • Atomic force microscope
  • Buffered hydrofluoric acid
  • Focused ion beam
  • Quartz

Cite this

Okumoto, T., Taniguchi, J., Momota, S., Kogo, Y., Kawasegi, N., & Morita, N. (2009). Ion-bombardment-enhanced etching of quartz. Paper presented at 5th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2009, Osaka, Japan.