Growth, quantum confinement and transport mechanisms of Ge nanodot arrays formed on a SiO2 monolayer

Yasuo Nakayama, Iwao Matsuda, Shuji Hasegawa, Masakazu Ichikawa

Research output: Contribution to journalReview articlepeer-review

3 Citations (Scopus)

Abstract

In this review, recent findings on growth manners, quantum confinement phenomena, and carrier transport mechanisms of self-assembled Ge nanodots on an oxidized Si surface are summarized. A simple equation relating the dot size, which was estimated by STM images, with the Ge coverage was proposed. Quantum confinement was observed by photoemission spectroscopy (PES) and scanning tunneling spectroscopy (STS), and the actual height of the confining potential was determined from the dot-size vs. energy relationship through a three dimensional parabolic potential model. The transport mechanism of the nanodot arrays, which was estimated based on the measurements by a microscopic four-point-probe method, was distinct depending on the structure of the dot-substrate interface. All results suggest that the interface oxide layer and subnanometer-sized voids on it interconnecting the nanodots with the substrate not only regulate the quantized energy in the nanodots but also switch on/off carrier exchange between the nanodot and the substrate through variable interface potential barrier height.

Original languageEnglish
Pages (from-to)191-201
Number of pages11
Journale-Journal of Surface Science and Nanotechnology
Volume6
DOIs
Publication statusPublished - 23 Aug 2008

Keywords

  • Electrical transport
  • Four-point probe conductivity measurement
  • Germanium
  • Interface barrier
  • Nanodot
  • Photoelectron spectroscopy
  • Quantum effects
  • Silicon

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