TY - JOUR
T1 - Fabrication process for micropatterned ceramics via UV-nanoimprint lithography using UV-curable binder
AU - Okabe, Takao
AU - Kim, Yongtae
AU - Jiao, Zhenjun
AU - Shikazono, Naoki
AU - Taniguchi, Jun
N1 - Publisher Copyright:
© 2018 The Japan Society of Applied Physics.
PY - 2018/10
Y1 - 2018/10
N2 - Ceramic electrochemical devices, such as solid oxide fuel cell (SOFC), require a high electrochemical reaction density. UV-nanoimprint lithography (UV-NIL) process comprising ceramic particles and a UV-curable resin as the binder was proposed to fabricate a high-aspect-patterned ceramic for SOFC. The proposed method was used to mold ceramic slurry with UV-curable binder that can cure with electrochemically-optimized ceramic particles. Last, the UV-cured ceramic was sintered, whereupon ceramic micropatterns were obtained on a ceramic substrate. The study chose a UV monomer and photo-initiator that would not contaminate SOFC material. The appropriate ratio of the monomer to the photo-initiator were investigated to conduct UV-NIL despite containing high ceramic concentration which absorbs UV wave length. The ratio of UV-curable resin to ceramic particles that resulted in minimal cracks during sintering process was found. Finally, the fabrication of ceramic pillar patterns was demonstrated.
AB - Ceramic electrochemical devices, such as solid oxide fuel cell (SOFC), require a high electrochemical reaction density. UV-nanoimprint lithography (UV-NIL) process comprising ceramic particles and a UV-curable resin as the binder was proposed to fabricate a high-aspect-patterned ceramic for SOFC. The proposed method was used to mold ceramic slurry with UV-curable binder that can cure with electrochemically-optimized ceramic particles. Last, the UV-cured ceramic was sintered, whereupon ceramic micropatterns were obtained on a ceramic substrate. The study chose a UV monomer and photo-initiator that would not contaminate SOFC material. The appropriate ratio of the monomer to the photo-initiator were investigated to conduct UV-NIL despite containing high ceramic concentration which absorbs UV wave length. The ratio of UV-curable resin to ceramic particles that resulted in minimal cracks during sintering process was found. Finally, the fabrication of ceramic pillar patterns was demonstrated.
UR - http://www.scopus.com/inward/record.url?scp=85055286218&partnerID=8YFLogxK
U2 - 10.7567/JJAP.57.106501
DO - 10.7567/JJAP.57.106501
M3 - Article
AN - SCOPUS:85055286218
SN - 0021-4922
VL - 57
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 10
M1 - 106501
ER -