Fabrication of vertically aligned diamond whiskers from highly boron-doped diamond by oxygen plasma etching

Chiaki Terashima, Kazuki Arihara, Sohei Okazaki, Tetsuya Shichi, Donald A. Tryk, Tatsuru Shirafuji, Nagahiro Saito, Osamu Takai, Akira Fujishima

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31 Citations (Scopus)

Abstract

Conductive diamond whiskers were fabricated by maskless oxygen plasma etching on highly boron-doped diamond substrates. The effects of the etching conditions and the boron concentration in diamond on the whisker morphology and overall substrate coverage were investigated. High boron-doping levels (greater than 8.4×10 20 cm -3) are crucial for the formation of the nanosized, densely packed whiskers with diameter of ca. 20 nm, length of ca. 200 nm, and density of ca. 3.8 × 10 10 cm -2 under optimal oxygen plasma etching conditions (10 min at a chamber pressure of 20 Pa). Confocal Raman mapping and scanning electron microscopy illustrate that the boron distribution in the diamond surface region is consistent with the distribution of whisker sites. The boron dopant atoms in the diamond appear to lead to the initial fine column formation. This simple method could provide a facile, cost-effective means for the preparation of conductive nanostructured diamond materials for electrochemical applications as well as electron emission devices.

Original languageEnglish
Pages (from-to)177-182
Number of pages6
JournalACS Applied Materials and Interfaces
Volume3
Issue number2
DOIs
Publication statusPublished - 23 Feb 2011

Keywords

  • Boron-doped diamond
  • Nanograss array
  • Nanostructure
  • Oxygen plasma
  • Reactive ion etching
  • Whisker

Cite this

Terashima, C., Arihara, K., Okazaki, S., Shichi, T., Tryk, D. A., Shirafuji, T., Saito, N., Takai, O., & Fujishima, A. (2011). Fabrication of vertically aligned diamond whiskers from highly boron-doped diamond by oxygen plasma etching. ACS Applied Materials and Interfaces, 3(2), 177-182. https://doi.org/10.1021/am1007722