Fabrication of low line edge roughness mold for photo-nanoimprint

Y. Kurashima; H. Hiroshima; M. Komuro; S. Kim; N. Yamazaki; J. Taniguchi; I. Miyamoto; H. Namatsu; S. Matsui

doi:10.1109/IMNC.2003.1268785

Fabrication of low line edge roughness mold for photo-nanoimprint

Y. Kurashima, H. Hiroshima, M. Komuro, S. Kim, N. Yamazaki, J. Taniguchi, I. Miyamoto, H. Namatsu, S. Matsui

Department of Applied Electronics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

In this paper, we fabricate low LER pattern on Spin On Glass (SOG) by simple nanoimprint process using a Si master mold obtained by anisotropic wet etching.

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	340-341
Number of pages	2
ISBN (Electronic)	4891140402, 9784891140403
DOIs	https://doi.org/10.1109/IMNC.2003.1268785
Publication status	Published - 2003
Event	International Microprocesses and Nanotechnology Conference, MNC 2003 - Tokyo, Japan Duration: 29 Oct 2003 → 31 Oct 2003

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Conference

Conference	International Microprocesses and Nanotechnology Conference, MNC 2003
Country/Territory	Japan
City	Tokyo
Period	29/10/03 → 31/10/03

Access to Document

10.1109/IMNC.2003.1268785

Cite this

Kurashima, Y., Hiroshima, H., Komuro, M., Kim, S., Yamazaki, N., Taniguchi, J., Miyamoto, I., Namatsu, H., & Matsui, S. (2003). Fabrication of low line edge roughness mold for photo-nanoimprint. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 (pp. 340-341). Article 1268785 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2003.1268785

Kurashima, Y. ; Hiroshima, H. ; Komuro, M. et al. / Fabrication of low line edge roughness mold for photo-nanoimprint. Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. pp. 340-341 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

@inproceedings{0a1f195191384197803bda95ad27f698,

title = "Fabrication of low line edge roughness mold for photo-nanoimprint",

abstract = "In this paper, we fabricate low LER pattern on Spin On Glass (SOG) by simple nanoimprint process using a Si master mold obtained by anisotropic wet etching.",

author = "Y. Kurashima and H. Hiroshima and M. Komuro and S. Kim and N. Yamazaki and J. Taniguchi and I. Miyamoto and H. Namatsu and S. Matsui",

note = "Publisher Copyright: {\textcopyright} 2003 Japan Soc. of Applied.; International Microprocesses and Nanotechnology Conference, MNC 2003 ; Conference date: 29-10-2003 Through 31-10-2003",

year = "2003",

doi = "10.1109/IMNC.2003.1268785",

language = "English",

series = "Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "340--341",

booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003",

}

Kurashima, Y, Hiroshima, H, Komuro, M, Kim, S, Yamazaki, N, Taniguchi, J, Miyamoto, I, Namatsu, H & Matsui, S 2003, Fabrication of low line edge roughness mold for photo-nanoimprint. in Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003., 1268785, Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003, Institute of Electrical and Electronics Engineers Inc., pp. 340-341, International Microprocesses and Nanotechnology Conference, MNC 2003, Tokyo, Japan, 29/10/03. https://doi.org/10.1109/IMNC.2003.1268785

Fabrication of low line edge roughness mold for photo-nanoimprint. / Kurashima, Y.; Hiroshima, H.; Komuro, M. et al.
Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc., 2003. p. 340-341 1268785 (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Fabrication of low line edge roughness mold for photo-nanoimprint

AU - Kurashima, Y.

AU - Hiroshima, H.

AU - Komuro, M.

AU - Kim, S.

AU - Yamazaki, N.

AU - Taniguchi, J.

AU - Miyamoto, I.

AU - Namatsu, H.

AU - Matsui, S.

PY - 2003

Y1 - 2003

N2 - In this paper, we fabricate low LER pattern on Spin On Glass (SOG) by simple nanoimprint process using a Si master mold obtained by anisotropic wet etching.

AB - In this paper, we fabricate low LER pattern on Spin On Glass (SOG) by simple nanoimprint process using a Si master mold obtained by anisotropic wet etching.

UR - http://www.scopus.com/inward/record.url?scp=84949193312&partnerID=8YFLogxK

U2 - 10.1109/IMNC.2003.1268785

DO - 10.1109/IMNC.2003.1268785

M3 - Conference contribution

AN - SCOPUS:84949193312

T3 - Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

SP - 340

EP - 341

BT - Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - International Microprocesses and Nanotechnology Conference, MNC 2003

Y2 - 29 October 2003 through 31 October 2003

ER -

Kurashima Y, Hiroshima H, Komuro M, Kim S, Yamazaki N, Taniguchi J et al. Fabrication of low line edge roughness mold for photo-nanoimprint. In Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003. Institute of Electrical and Electronics Engineers Inc. 2003. p. 340-341. 1268785. (Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003). doi: 10.1109/IMNC.2003.1268785

Fabrication of low line edge roughness mold for photo-nanoimprint

Abstract

Publication series

Conference

Access to Document

Other files and links

Fingerprint

Cite this