Fabrication of low line edge roughness mold by SOG replica method

Y. Kurashima, H. Hiroshima, M. Komuro, N. Yamazaki, J. Taniguchi, I. Miyamoto

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The fabrication of spin on glass (SOG) mold with low line edge roughness (LER) by the SOG replica method was demonstrated and photo-nanoimprint was carried out using the SOG replica mold. A Si (110) substrate was patterned with electron beam lithography and anisotropically etched in KOH solutions. The pattern top surface of Si master mold was found to be very smooth compared with the bottom surface. The results show LER of PAK-01 pattern to be 0.86 nm, where the LER of Si master mold pattern was 0.74 nm.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2004
Pages66-67
Number of pages2
Publication statusPublished - 1 Dec 2004
Event2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan
Duration: 26 Oct 200429 Oct 2004

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2004

Conference

Conference2004 International Microprocesses and Nanotechnology Conference
CountryJapan
CityOsaka
Period26/10/0429/10/04

    Fingerprint

Cite this

Kurashima, Y., Hiroshima, H., Komuro, M., Yamazaki, N., Taniguchi, J., & Miyamoto, I. (2004). Fabrication of low line edge roughness mold by SOG replica method. In Digest of Papers - Microprocesses and Nanotechnology 2004 (pp. 66-67). [28A-5-1] (Digest of Papers - Microprocesses and Nanotechnology 2004).