TY - JOUR
T1 - Electrical resistivity and thermopower of hole-doped delafossite CuCoO2 polycrystals
AU - Kurita, K.
AU - Yagisawa, M.
AU - Okazaki, R.
N1 - Funding Information:
Experimental help by Ms. Minami Kato and Professor Masafumi Tamura is acknowledged. This work was supported by JSPS KAKENHI Grants No. JP18K03503 and No. JP18K13504.
PY - 2021/1
Y1 - 2021/1
N2 - We have synthesized the polycrystalline samples of the delafossite oxide CuCo1−yMgyO2 through the thermal decomposition of copper–cobalt–magnesium hydroxycarbonates. As is expected from the theoretical calculations, relatively large thermopower of S ∼ 700 μV K−1 is observed at room temperature in the parent compound CuCoO2, whereas the resistivity is too high even in the doped compounds compared with other thermoelectric oxides. The high-temperature transport is thermal-activation type characterized by two energy gaps, Δρ and ΔS, which are estimated from the resistivity and the thermopower, respectively. In the parent compound, we obtain Δρ ; 0.47 eV and ΔS ; 0.38 eV. We find that Δρ is larger than ΔS in all the samples, implying a mobility gap opening due to a grain-boundary scattering.
AB - We have synthesized the polycrystalline samples of the delafossite oxide CuCo1−yMgyO2 through the thermal decomposition of copper–cobalt–magnesium hydroxycarbonates. As is expected from the theoretical calculations, relatively large thermopower of S ∼ 700 μV K−1 is observed at room temperature in the parent compound CuCoO2, whereas the resistivity is too high even in the doped compounds compared with other thermoelectric oxides. The high-temperature transport is thermal-activation type characterized by two energy gaps, Δρ and ΔS, which are estimated from the resistivity and the thermopower, respectively. In the parent compound, we obtain Δρ ; 0.47 eV and ΔS ; 0.38 eV. We find that Δρ is larger than ΔS in all the samples, implying a mobility gap opening due to a grain-boundary scattering.
UR - http://www.scopus.com/inward/record.url?scp=85099122420&partnerID=8YFLogxK
U2 - 10.35848/1347-4065/abd448
DO - 10.35848/1347-4065/abd448
M3 - Article
AN - SCOPUS:85099122420
VL - 60
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 1
M1 - 013001 013001
ER -