Direct bonding of Germanium and Diamond substrates by reduction process

Yuki Minowa, Takashi Matsumae, Masanori Hayase, Yuichi Kurashima, Hideki Takagi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

For efficient heat dissipation from Ge-based high-speed devices, we performed direct bonding of Ge and diamond substrates. The conventional hydrophilic bonding process employs oxidizing pre-bonding treatment; however, this process develops a thick oxide layer at the bonding interface. In this study, the Ge substrate was reduced by HCl acid and then bonded with the diamond substrate. The thickness of the bonding interface was 1.6 μm, which is significantly thin compared with the previous studies using the oxidizing treatment.

Original languageEnglish
Title of host publication2024 International Conference on Electronics Packaging, ICEP 2024
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages119-120
Number of pages2
ISBN (Electronic)9784991191176
DOIs
Publication statusPublished - 2024
Event23rd International Conference on Electronics Packaging, ICEP 2024 - Toyama, Japan
Duration: 17 Apr 202420 Apr 2024

Publication series

Name2024 International Conference on Electronics Packaging, ICEP 2024

Conference

Conference23rd International Conference on Electronics Packaging, ICEP 2024
Country/TerritoryJapan
CityToyama
Period17/04/2420/04/24

Keywords

  • Germanium
  • diamond
  • direct bonding
  • hydrophilic bonding
  • reduction process

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