Complete decomposition of sulfamethoxazole during an advanced oxidation process in a simple water treatment system

Norihiro Suzuki, Akihiro Okazaki, Kai Takagi, Izumi Serizawa, Yuki Hirami, Hiroya Noguchi, Sudhagar Pitchaimuthu, Chiaki Terashima, Tomonori Suzuki, Naoya Ishida, Kazuya Nakata, Ken ichi Katsumata, Takeshi Kondo, Makoto Yuasa, Akira Fujishima

Research output: Contribution to journalArticlepeer-review

Abstract

A simple water treatment system consisting of a deep UV light (λ = 222 nm) source, a mesoporous TiO2/boron-doped diamond (BDD) photocatalyst, and a BDD electrode was prepared and used to decompose sulfamethoxazole (SMX) in an advanced oxidation process. The mesoporous TiO2/BDD photocatalyst used with the electrochemical treatment promoted SMX decomposition, but the mesoporous TiO2/BDD photocatalyst alone had a similar ability to decompose SMX as photolysis. Fragments produced through photocatalytic treatment were decomposed during the electrochemical treatment and fragments produced during the electrochemical treatment were decomposed during the photocatalytic treatment, so performing the electrochemical and photocatalytic treatments together effectively decomposed SMX and decrease the total organic carbon concentration to a trace.

Original languageEnglish
Article number132029
JournalChemosphere
Volume287
DOIs
Publication statusPublished - Jan 2022

Keywords

  • Advanced oxidation process
  • Boron-doped diamond
  • Electrochemistry
  • Photocatalyst
  • Sulfamethoxazole
  • Water purification

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