Skip to main navigation Skip to search Skip to main content

Characterization of lattice mosaic of a-plane GaN grown on r-plane sapphire by metalorganic vapor-phase epitaxy

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Nonpolar a-plane GaN films were grown on r-plane sapphire substrates by atmospheric metalorganic vapor-phase epitaxy. The as-grown layers were studied by high-resolution x-ray diffraction. The a-plane GaN lattice mosaic is orientation dependent as determined by x-ray rocking curve (XRC) measurements. The tilt mosaic measured with the c-axis within the scattering plane (c-mosaic) was greater than the mosaic measured with the m-axis within the scattering plane (m-mosaic). The mosaic along both azimuths decreased and the c-mosaic/m-mosaic ratio was increased with increase of growth temperature from 1050°C to 1080°C. The morphological transition was correlated to change in the a-plane GaN tilt mosaic measured by XRC.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages659-663
Number of pages5
Publication statusPublished - 2006
Event2005 Materials Research Society Fall Meeting - Boston, MA, United States
Duration: 28 Nov 20052 Dec 2005

Publication series

NameMaterials Research Society Symposium Proceedings
Volume892
ISSN (Print)0272-9172

Conference

Conference2005 Materials Research Society Fall Meeting
Country/TerritoryUnited States
CityBoston, MA
Period28/11/052/12/05

Fingerprint

Dive into the research topics of 'Characterization of lattice mosaic of a-plane GaN grown on r-plane sapphire by metalorganic vapor-phase epitaxy'. Together they form a unique fingerprint.

Cite this