Analysis of the electron-beam-induced reaction in the precursor thin films of ferroelectric SrBi2Ta2O9

Soichiro Okamura, Tadashi Shiosaki

Research output: Contribution to conferencePaperpeer-review

4 Citations (Scopus)

Abstract

The electron-beam-induced reaction in the precursor thin films of ferroelectric SrBi2Ta2O9 was investigated by infrared spectroscopy. Precursor solutions were prepared by mixing metal 2-ethylhexanoates. An electron beam was irradiated on the precursor thin films formed on Ag/SiO2/Si substrates. Total electron doses were adjusted ranging from 0 to 1.9×10-3 C/cm2. As a result, it was found that the electron beam resolved -COO- in the metal 2-ethylhexanoates, and metal atoms lost hydrophobic groups and remained in the films as a form of hydroxide. It is a reason why precursor thin films are changed to be insoluble in organic solvents by electron beam irradiation. The SrBi2Ta2O9 patterns fabricated by the electron-beam-induced process were very leaky though the thin films prepared using the same solutions exhibited good ferroelectric properties.

Original languageEnglish
Pages171-174
Number of pages4
Publication statusPublished - 1998
EventProceedings of the 1998 11th IEEE International Symposium on Appliations of Ferroelectrics (ISAF-XI) - Montreaux, Switz
Duration: 24 Aug 199827 Aug 1998

Conference

ConferenceProceedings of the 1998 11th IEEE International Symposium on Appliations of Ferroelectrics (ISAF-XI)
CityMontreaux, Switz
Period24/08/9827/08/98

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