3D nanofabrication using controlled-acceleration-voltage electron beam lithography with nanoimprinting technology

Noriyuki Unno, Jun Taniguchi

Research output: Contribution to journalReview article

Abstract

Nanostructures have unique characteristics, such as large specific surface areas, that provide a wide range of engineering applications, such as electronics, optics, biotics, and thermal and fluid dynamics. They can be used to downsize many engineering products; therefore, new nanofabrication techniques are strongly needed to meet this demand. A simple fabrication process with high throughput is necessary for low-cost nanostructures. In recent years, three-dimensional (3D) nanostructures have attracted much attention because they dramatically opened up new fields for applications. However, conventional techniques for fabricating 3D nanostructures contain many complex processes, such as multiple patterning lithography, metal deposition, lift-off, etching, and chemical-mechanical polishing. This paper focuses on controlled-acceleration-voltage electron beam lithography (CAV-EBL), which can fabricate 3D nanostructures in one shot. The applications of 3D nanostructures are introduced, and the conventional 3D patterning technique is compared with CAV-EBL and various 3D patterning techniques using CAV-EBL with nanoimprinting technology. Finally, the outlook for next-generation devices that can be fabricated by CAV-EBL is presented.

Original languageEnglish
Pages (from-to)253-266
Number of pages14
JournalAdvanced Optical Technologies
Volume8
Issue number3-4
DOIs
Publication statusPublished - 1 Jun 2019

Fingerprint

Electron beam lithography
nanofabrication
Nanotechnology
Nanostructures
lithography
electron beams
Electric potential
electric potential
engineering
fluid dynamics
Chemical mechanical polishing
polishing
shot
Fluid dynamics
Specific surface area
Lithography
etching
optics
Etching
Optics

Keywords

  • 3D patterning
  • electron beam lithography
  • nanoimprint
  • nanostructure
  • roll substrate

Cite this

@article{4beeb957d91142069c300be82005f878,
title = "3D nanofabrication using controlled-acceleration-voltage electron beam lithography with nanoimprinting technology",
abstract = "Nanostructures have unique characteristics, such as large specific surface areas, that provide a wide range of engineering applications, such as electronics, optics, biotics, and thermal and fluid dynamics. They can be used to downsize many engineering products; therefore, new nanofabrication techniques are strongly needed to meet this demand. A simple fabrication process with high throughput is necessary for low-cost nanostructures. In recent years, three-dimensional (3D) nanostructures have attracted much attention because they dramatically opened up new fields for applications. However, conventional techniques for fabricating 3D nanostructures contain many complex processes, such as multiple patterning lithography, metal deposition, lift-off, etching, and chemical-mechanical polishing. This paper focuses on controlled-acceleration-voltage electron beam lithography (CAV-EBL), which can fabricate 3D nanostructures in one shot. The applications of 3D nanostructures are introduced, and the conventional 3D patterning technique is compared with CAV-EBL and various 3D patterning techniques using CAV-EBL with nanoimprinting technology. Finally, the outlook for next-generation devices that can be fabricated by CAV-EBL is presented.",
keywords = "3D patterning, electron beam lithography, nanoimprint, nanostructure, roll substrate",
author = "Noriyuki Unno and Jun Taniguchi",
year = "2019",
month = "6",
day = "1",
doi = "10.1515/aot-2019-0004",
language = "English",
volume = "8",
pages = "253--266",
journal = "Advanced Optical Technologies",
issn = "2192-8576",
publisher = "de Gruyter",
number = "3-4",

}

3D nanofabrication using controlled-acceleration-voltage electron beam lithography with nanoimprinting technology. / Unno, Noriyuki; Taniguchi, Jun.

In: Advanced Optical Technologies, Vol. 8, No. 3-4, 01.06.2019, p. 253-266.

Research output: Contribution to journalReview article

TY - JOUR

T1 - 3D nanofabrication using controlled-acceleration-voltage electron beam lithography with nanoimprinting technology

AU - Unno, Noriyuki

AU - Taniguchi, Jun

PY - 2019/6/1

Y1 - 2019/6/1

N2 - Nanostructures have unique characteristics, such as large specific surface areas, that provide a wide range of engineering applications, such as electronics, optics, biotics, and thermal and fluid dynamics. They can be used to downsize many engineering products; therefore, new nanofabrication techniques are strongly needed to meet this demand. A simple fabrication process with high throughput is necessary for low-cost nanostructures. In recent years, three-dimensional (3D) nanostructures have attracted much attention because they dramatically opened up new fields for applications. However, conventional techniques for fabricating 3D nanostructures contain many complex processes, such as multiple patterning lithography, metal deposition, lift-off, etching, and chemical-mechanical polishing. This paper focuses on controlled-acceleration-voltage electron beam lithography (CAV-EBL), which can fabricate 3D nanostructures in one shot. The applications of 3D nanostructures are introduced, and the conventional 3D patterning technique is compared with CAV-EBL and various 3D patterning techniques using CAV-EBL with nanoimprinting technology. Finally, the outlook for next-generation devices that can be fabricated by CAV-EBL is presented.

AB - Nanostructures have unique characteristics, such as large specific surface areas, that provide a wide range of engineering applications, such as electronics, optics, biotics, and thermal and fluid dynamics. They can be used to downsize many engineering products; therefore, new nanofabrication techniques are strongly needed to meet this demand. A simple fabrication process with high throughput is necessary for low-cost nanostructures. In recent years, three-dimensional (3D) nanostructures have attracted much attention because they dramatically opened up new fields for applications. However, conventional techniques for fabricating 3D nanostructures contain many complex processes, such as multiple patterning lithography, metal deposition, lift-off, etching, and chemical-mechanical polishing. This paper focuses on controlled-acceleration-voltage electron beam lithography (CAV-EBL), which can fabricate 3D nanostructures in one shot. The applications of 3D nanostructures are introduced, and the conventional 3D patterning technique is compared with CAV-EBL and various 3D patterning techniques using CAV-EBL with nanoimprinting technology. Finally, the outlook for next-generation devices that can be fabricated by CAV-EBL is presented.

KW - 3D patterning

KW - electron beam lithography

KW - nanoimprint

KW - nanostructure

KW - roll substrate

UR - http://www.scopus.com/inward/record.url?scp=85067211617&partnerID=8YFLogxK

U2 - 10.1515/aot-2019-0004

DO - 10.1515/aot-2019-0004

M3 - Review article

AN - SCOPUS:85067211617

VL - 8

SP - 253

EP - 266

JO - Advanced Optical Technologies

JF - Advanced Optical Technologies

SN - 2192-8576

IS - 3-4

ER -