Keyphrases
Ultraviolet Nanoimprint Lithography (UV-NIL)
48%
Nanoimprint Lithography
27%
Electron Beam Lithography
27%
Photocurable Resin
26%
Nanoimprint
20%
Nanopatterning
20%
Three-dimensional (3D)
19%
Replica Mold
17%
Anti-reflection Structure
17%
Electron Beam
15%
Focused Ion Beam
14%
Resin
13%
Chemical Etching
12%
Electron Beam Resist
11%
Spinon
11%
Fabrication Methods
11%
Roll Mold
11%
Single Crystal Diamond
10%
Roll-to-roll
9%
High-throughput
9%
Diamond
9%
Digital Holographic
9%
Accelerating Voltage
9%
On-glass
9%
Nanoimprint Mold
9%
UV-cured Polymer
8%
Master Mold
8%
Ion Beam Irradiation
8%
Release Agent
8%
Particle Tracking Velocimetry
8%
Liquid Transfer Imprint Lithography
7%
Line-and-space Pattern
7%
Glassy Carbon
7%
Pattern Transfer
7%
Release Coating
7%
High-resolution
7%
Oxygen Ion Beam
7%
Post Exposure Bake
7%
Line Edge Roughness
6%
Nanoimprint Technology
6%
Moth-eye Structure
6%
Molecular Dynamics Simulation
6%
Residual Layer
6%
Imprinting Technique
5%
Mould Surface
5%
Lithography Process
5%
Silica
5%
High Aspect Ratio
5%
Imprinting Technology
5%
Liquid Polymer
5%
Engineering
Nanoimprint Lithography
62%
Electron Optical Lithography
25%
Nanoscale
22%
Diamond
15%
Release Agent
12%
UV Nanoimprint Lithography
12%
Focused Ion Beam
11%
Master Mold
10%
Diamond Crystal
10%
High Resolution
10%
Imprint Lithography
9%
Nanomaterial
9%
Glassy Carbon
8%
Beam Irradiation
8%
Holograms
7%
Pattern Transfer
7%
Oxygen Ion
7%
Silicon Dioxide
7%
High Aspect Ratio
6%
Lithography
6%
Photocurable Resin
6%
Scanning Electron Microscope
5%
Fabrication Method
5%
Edge Roughness
5%
Liquid Polymer
5%
Adhesive Force
5%
Material Science
Lithography
100%
Surface (Surface Science)
29%
Film
22%
Focused Ion Beam
20%
Diamond
11%
Silicon
10%
Single Crystal
7%
Nanostructure
7%
Glassy Carbon
5%
Silver
5%
